Research-Thermal Evaporator
Organic and Metal Film Deposition for OLED Research
设备·技术
显示设备
了解成就ICD世界首创的显示设备自主技术、工艺与量产设备。
显示设备 / 生产系统
从大面积量产设备 到研发用蒸镀系统。
Production experience in OLED, LTPO, LTPS and Oxide TFT connects etch, ashing, surface treatment and deposition in one equipment portfolio.
查看技术信息
Technical Information
PROCESS
- Plasma Treatment
- Organic Deposition
- Metal Deposition
- Encapsulation
APPLICATIONS
- Research OLED
- Small-glass OLED panel fabrication
INTRODUCTION
- Research equipment specialized for treatment and organic / metal deposition on small glass substrates.
TECHNOLOGY
- Small-deposit full-auto process after plasma treatment
- Reliable OLED panel fabrication
- Optimized for process changes and customer requirements
FEATURES
- Glass Size: ~200 × 200 mm
- Vacuum Range (HV): E-7 Torr
- Vacuum Range (UHV): E-8 Torr
- Organic Source Temperature: ~450°C
- Metal Source Temperature: ~1800°C
- Plasma Treatment Gas: N₂ · O₂ · Ar · ETC.