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了解成就ICD世界首创的显示设备自主技术、工艺与量产设备。

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从大面积量产设备到研发用蒸镀系统。

Production experience in OLED, LTPO, LTPS and Oxide TFT connects etch, ashing, surface treatment and deposition in one equipment portfolio.

Display Pattern Etching for OLED and LCD

Plasma Treatment Before OLED Evaporation

A plasma etching and ashing system that generates plasma inside a chamber to etch thin-film patterns and form electrical circuits.
The ICD ICP DRY Etcher is optimized for manufacturing organic light-emitting diode (OLED) and liquid crystal displays (LCD).

Process gas and RF power generate plasma in a vacuum chamber for physical and chemical dry etching of thin films on glass substrates
Equipment line-up for AMOLED, QD, LTPS, LTPO, Oxide TFT and TFT-LCD applications
High production capability, etch rate and uniformity
MURA, ESD, ARC and Dint suppression

A core plasma treatment system for OLED production lines before evaporation.
Recognized by major panel manufacturers in Korea and overseas for its product performance and mass-production capability, the system has established a strong position in pre-evaporation plasma treatment.

Process gas and RF power in a vacuum chamber enable physical and chemical etching of target materials on glass
PE Mode: Uniformity control through anode/cathode spacing and gas flow
ICP Mode: Local uniformity control through VVC and coil-step adjustment